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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

2012, ISBN: 9783642273803

ID: 703413056

{´´p´´:´´To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. ´´} This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples. Bücher > Fremdsprachige Bücher > Englische Bücher gebundene Ausgabe 25.10.2012 Buch (fremdspr.), Springer, .201

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

ISBN: 9783642273803

ID: 778130430

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples. Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, Springer

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Livre non disponible
(*)
Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented., DE, [SC: 0.00], Neuware, gewerbliches Angebot, FixedPrice, 528, [GW: 939g], offene Rechnung (Vorkasse vorbehalten), PayPal, Banküberweisung

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Livre non disponible
(*)
Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented., DE, Neuware, gewerbliches Angebot, FixedPrice, 528, [GW: 939g], offene Rechnung (Vorkasse vorbehalten), PayPal, Banküberweisung

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
Livre non disponible
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Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

1, ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented., DE, [SC: 0.00], Neuware, gewerbliches Angebot, 244x159x40 mm, 528, [GW: 939g], Banküberweisung, PayPal

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