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Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai
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Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai:

Sub-Half-Micron Lithography for ULSIs - edition reliée, livre de poche

ISBN: 0521570808

ID: 1166930419

[EAN: 9780521570800], Neubuch, [PU: Cambridge University Press], BRAND NEW, Sub-Half-Micron Lithography for ULSIs, Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai, In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.

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Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics  &  Microelectronic Engineering) - Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai
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Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai:

Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering) - livre d'occasion

ISBN: 0521570808

ID: 4809716

In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue, a breakthrough in lithography technology is now needed. This book describes advanced techniques under development that represent the key to future semiconductor-device fabrication. To help the reader understand the background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, x-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. Other relevant technologies, such as those that concern resist materials, metrology, and defect inspection and repair are also described. electrical and electronics,engineering Books, Cambridge University Press

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Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor P hysics & Microelectronic Engineering) - Ochiai, Yukinori
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Ochiai, Yukinori:
Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor P hysics & Microelectronic Engineering) - edition reliée, livre de poche

2000

ISBN: 0521570808

ID: 716888191

[EAN: 9780521570800], [PU: Cambridge University Press], A crisp clean hardcover, no markings throughout: In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue, a breakthrough in lithography technology is now needed. This book describes advanced techniques under development that represent the key to future semiconductor-device fabrication. To help the reader understand the background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, x-ray lithography, electron-beam lithography, and focused ion- beam lithography are described in detail by experts in each area. Other relevant technologies, such as those that concern resist materials, metrology, and defect inspection and repair are also described.

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Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki
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Katsumi Suzuki:
Sub-Half-Micron Lithography for ULSIs - edition reliée, livre de poche

ISBN: 9780521570800

Hardback, [PU: CAMBRIDGE UNIVERSITY PRESS], Describes advanced techniques under development that represent the key to future semiconductor-device fabrication., Semi-conductors & Super-conductors

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Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai
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Katsumi Suzuki; Shinji Matsui; Yukinori Ochiai:
Sub-Half-Micron Lithography for ULSIs - edition reliée, livre de poche

2000, ISBN: 9780521570800

ID: 724033

Hardcover, Buch, [PU: Cambridge University Press]

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Détails sur le livre
Sub-Half-Micron Lithography for Ulsis
Auteur:

Editor-Katsumi Suzuki; Editor-Shinji Matsui; Editor-Yukinori Ochiai

Titre:

Sub-Half-Micron Lithography for Ulsis

ISBN:

0521570808

Informations détaillées sur le livre - Sub-Half-Micron Lithography for Ulsis


EAN (ISBN-13): 9780521570800
ISBN (ISBN-10): 0521570808
Version reliée
Date de parution: 2000
Editeur: CAMBRIDGE UNIV PR
342 Pages
Langue: eng/Englisch

Livre dans la base de données depuis 31.05.2007 00:44:41
Livre trouvé récemment le 25.01.2017 10:47:45
ISBN/EAN: 0521570808

ISBN - Autres types d'écriture:
0-521-57080-8, 978-0-521-57080-0

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