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Plasma Processes For Semiconductor Fabrication: Plasma Processes For Semicondu - W. N. G. Hitchon
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W. N. G. Hitchon:
Plasma Processes For Semiconductor Fabrication: Plasma Processes For Semicondu - nouveau livre

ISBN: 9780521018005

ID: 978052101800

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry. W. N. G. Hitchon, Books, Science and Nature, Plasma Processes For Semiconductor Fabrication: Plasma Processes For Semicondu Books>Science and Nature, Cambridge University Press

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Plasma Processes for Semiconductor Fabrication - Hitchon, W. N. G.
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Hitchon, W. N. G.:
Plasma Processes for Semiconductor Fabrication - Livres de poche

ISBN: 9780521018005

[ED: Softcover], [PU: CAMBRIDGE UNIV PR], Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.231 p. - 31 line diagrams 2 tables 33 exercisesVersandfertig in über 4 Wochen

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Plasma Processes for Semiconductor Fabrication - Hitchon, W. N. G.
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Hitchon, W. N. G.:
Plasma Processes for Semiconductor Fabrication - nouveau livre

2005, ISBN: 0521018005, Lieferbar binnen 4-6 Wochen Frais d'envoiVersandkostenfrei innerhalb der BRD

ID: 9780521018005

Internationaler Buchtitel. In englischer Sprache. Verlag: CAMBRIDGE UNIV PR, 232 Seiten, L=178mm, B=254mm, H=12mm, Gew.=434gr, [GR: 16800 - HC/Technik], [SW: - Technology & Industrial Arts], Kartoniert/Broschiert, Klappentext: An up-to-date description of plasma etching and deposition in semiconductor fabrication. An up-to-date description of plasma etching and deposition in semiconductor fabrication.

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Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) - W. N. G. Hitchon
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W. N. G. Hitchon:
Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) - Livres de poche

2011, ISBN: 9780521018005

ID: 407626825

Cambridge University Press, 2011. Paperback. New. This item is printed on demand. This is a scanned copy. Superior quality paper and print.Absolutely Brand New & In Stock. 100% 30-Day Money Back. Direct from our warehouse. Ships by USPS and UPS. Happy Customers is Our #1 Goal., Cambridge University Press, 2011

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Plasma Processes for Semiconductor Fabrication - W.N.G. Hitchon
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W.N.G. Hitchon:
Plasma Processes for Semiconductor Fabrication - Livres de poche

ISBN: 9780521018005

Paperback, [PU: CAMBRIDGE UNIVERSITY PRESS], An up-to-date description of plasma etching and deposition in semiconductor fabrication., Semi-conductors & Super-conductors

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Détails sur le livre
Plasma Processes for Semiconductor Fabrication

An up-to-date description of plasma etching and deposition in semiconductor fabrication.

Informations détaillées sur le livre - Plasma Processes for Semiconductor Fabrication


EAN (ISBN-13): 9780521018005
ISBN (ISBN-10): 0521018005
Livre de poche
Date de parution: 2005
Editeur: CAMBRIDGE UNIV PR
232 Pages
Poids: 0,434 kg
Langue: eng/Englisch

Livre dans la base de données depuis 26.06.2007 16:42:09
Livre trouvé récemment le 16.03.2017 14:36:25
ISBN/EAN: 0521018005

ISBN - Autres types d'écriture:
0-521-01800-5, 978-0-521-01800-5


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