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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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Siegfried Hofmann:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented., [SC: 0.00], Neuware, gewerbliches Angebot, FixedPrice, [GW: 939g]

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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Siegfried Hofmann:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - nouveau livre

ISBN: 9783642273803

[ED: Buch], [PU: Springer-Verlag GmbH], Neuware - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. -, [SC: 0.00]

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Siegfried Hofmann
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Siegfried Hofmann:
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - edition reliée, livre de poche

ISBN: 9783642273803

ID: 9783642273803

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide Auger-and-X-Ray-Photoelectron-Spectroscopy-in-Materials-Science~~Siegfried-Hofmann Science/Tech>Physics>Physics Hardcover, Springer Berlin Heidelberg

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Auger- and X-ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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Siegfried Hofmann:
Auger- and X-ray Photoelectron Spectroscopy in Materials Science - nouveau livre

2012, ISBN: 3642273807

ID: 17167577122

[EAN: 9783642273803], Neubuch, [PU: Springer-Verlag Berlin and Heidelberg GmbH and Co. KG], New Book. Shipped from US within 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

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Auger- And X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Hofmann, Siegfried
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Hofmann, Siegfried:
Auger- And X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - edition reliée, livre de poche

2012, ISBN: 9783642273803

ID: 13265490296

Hard cover, New., Sewn binding. Cloth over boards. 528 p. Contains: Illustrations, color. Springer Series in Surface Sciences, 49., [PU: Springer]

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Détails sur le livre
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Auteur:

Siegfried Hofmann

Titre:

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

ISBN:

3642273807

Informations détaillées sur le livre - Auger- and X-Ray Photoelectron Spectroscopy in Materials Science


EAN (ISBN-13): 9783642273803
ISBN (ISBN-10): 3642273807
Version reliée
Date de parution: 2012
Editeur: Springer-Verlag GmbH
528 Pages
Poids: 0,939 kg
Langue: Englisch

Livre dans la base de données depuis 19.06.2007 21:28:18
Livre trouvé récemment le 22.09.2016 23:58:30
ISBN/EAN: 3642273807

ISBN - Autres types d'écriture:
3-642-27380-7, 978-3-642-27380-3

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